Advanced Energy’s Luxtron® FluorOptic Temperature (FOT) Sensors use the principles of phosphorescence to deliver high-accuracy temperature monitoring for critical semiconductor applications such as plasma etch and plasma-enhanced deposition. The sensors are immune to interference from RF and microwave sources, enabling precise process control required to achieve device performance and yield for leading-edge semiconductor devices.
The Luxtron® M-1000 is the latest FOT converter platform, featuring an advanced light source and improved electronics for ultralow noise. In addition, two new proprietary phosphor formulations, VioLux™ and RubiLux™, have been developed to work in concert with the M-1000 to deliver sub 0.5 °C accuracy and excellent repeatability, and stability over an extended range -of 200 to 450 °C. This extended temperature range enables both cryogenic and high-temperature etch processes, both of which are critical for etching advanced high aspect ratio devices, such as 3D NAND.